Structural, optical and electrical properties of ZnO thin films grown by radio frequency (rf) sputtering in oxygen atmosphere

Juan M. Camacho; R. Castro-Rodriguez; A. Iribarren; E. Chan y Diaz; A. Duarte-Moller; P. Sanchez Santiago

doi:10.5897/IJPS11.898

International Journal of
Physical Sciences

Abbreviation: Int. J. Phys. Sci.
Language: English
ISSN: 1992-1950
DOI: 10.5897/IJPS
Start Year: 2006
Published Articles: 2578

Full Length Research Paper

Structural, optical and electrical properties of ZnO thin films grown by radio frequency (rf) sputtering in oxygen atmosphere

Juan M. Camacho1, R. Castro-Rodríguez1, A. Iribarren2, E. Chan y Díaz3*, A. Duarte-Moller3 and P. Sánchez Santiago3

1Applied Physics Department, CINVESTAV-IPN, Unidad Mérida, 97310, Mérida, Yucatán, México. 2D.I.E.E.S. Instituto de Materiales y Reactivos, Universidad de La Habana, Zapata y G, Vedado, Plaza, Ciudad de la Habana 10400, Cuba. 3Centro de Investigación en Materiales Avanzados, Miguel de Cervantes Saavedra 120, Complejo industrial Chihuahua 31109, Chihuahua, Chih, México.
Email: [email protected]

Article Number - 4DCC1E720136
Vol.6(29), pp. 6660 - 6663 , November 2011
https://doi.org/10.5897/IJPS11.898

Accepted: 12 October 2011
Published: 16 November 2011

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