Scientific Research and Essays

  • Abbreviation: Sci. Res. Essays
  • Language: English
  • ISSN: 1992-2248
  • DOI: 10.5897/SRE
  • Start Year: 2006
  • Published Articles: 2752

Full Length Research Paper

Preventive maintenance model with FMEA and Monte Carlo simulation for the key equipment in semiconductor foundries

  Tsu-Ming Yeh* and Jia-Jeng Sun    
Department of Industrial Engineering and Technology Management, Dayeh University, Taiwan.
Email: [email protected]

  •  Accepted: 24 October 2011
  •  Published: 09 November 2011



Semiconductor foundries have entered an era of 12-inch wafers and over five hundred production processes involved in manufacturing and measurement. In order to stabilize equipment and reduce variations in processes, an effective equipment maintenance model is required. This study thus aimed to establish a model to maintain the key equipment in a semiconductor factory, based on its history of preventative maintenance (PM) and applying Monte Carlo simulation to predict the probability of the next PM time-point. Focusing on a semiconductor foundry producing RAM, this study found that Chamber2 in the diffusion zone is the key equipment in the FMEA (failure mode and effect analysis), categorized the historical data from various phases to be applied to Monte Carlo simulation, and, with 10,000 simulations and computations, obtained the maintenance time-point probability and the appropriate date for Chamber2 to be the subject of a management review.


Key words: preventive maintenance, Monte Carlo simulation, failure mode and effect analysis (FMEA).


 PM, Preventative maintenance; FMEA, failure mode and effect analysis; IC, integrated circuits; CD, critical dimensions; RPN, risk priority number; CB, crystal ball.