The Cobalt (Co) (FCC)-Copper (Cu) magnetic films with different compositions (x = 55.5, 44.4, 22.5) grown on glass substrate are prepared by sputtering process using a Co target and Cu sheets. The effects of the composition on morphological, structural and magnetic of the films were reported. Scanning electron microscopy (SEM) results showed that the film thickness is about 80 nm. Atomic force microscopy (AFM) measurements revealed that surface roughness of Co-Cu films is in the range of 1 to 6 nm. From vibrating sample magnetometer (VSM) result, it clearly shows that not only remanent and saturation magnetizations are increased with Co fraction but also coercivity and squareness. All results revealed that the increase of Co fraction gives rise to the lower surface roughness and the higher coercive field because of the Co coalescence and their distribution in Cu matrix.
Key words: Sputtered Co-Cu films, granular films, roughness, hysteresis.
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