International Journal of
Physical Sciences

  • Abbreviation: Int. J. Phys. Sci.
  • Language: English
  • ISSN: 1992-1950
  • DOI: 10.5897/IJPS
  • Start Year: 2006
  • Published Articles: 2572

Full Length Research Paper

The impact of plasma interference profile (PIP) on argon discharge in plasma focus device

Muhammad Zubair Khan1,2*, Yap Seong Ling1 and Wong Chiow San1  
1Department of Physics, Faculty of Science, University of Malaya (UM), Plasma Technology Research Center, 50603 Kuala Lumpur Malaysia. 2Department of Physics, Federal Urdu University of Arts, Science and Technology (FUUAST) 45320 Islamabad Pakistan.
Email: [email protected]

  •  Accepted: 22 February 2013
  •  Published: 28 February 2013

Abstract

Radiation emission in a low energy (2.2 kJ, 12 kV) UM plasma focus is studied. The system is operated in Argon filling gas. Enrichment of the radiation emission yield is obtained with an optimized pressure 1.7 mbar. Time resolved radiation emission measurements are made by using an array of PIN diode detectors covered with few Al foil thicknesses, to be found at top arrangement at distance 43.50 cm from the edged-surface of hollow anode (18 cm length/1.9 cm diameter). A notable increase of radiation yield is achieved at 1.7 mbar, which is about 0.00253 mJ with efficiency of 0.00012%, and also a pragmatic consequence of ionized gas particles so-called plasma interference profile impact on the radiation emission taken as a whole. The findings may exceedingly take part in a foundation of potential applications of the electron beam emission from plasma focus (PF) device.

 

Key words: Dense plasma focus, UM plasma focus, radiation emission, x-ray yields, argon plasma, electron beam, plasma interference profile (PIP).