International Journal of
Physical Sciences

  • Abbreviation: Int. J. Phys. Sci.
  • Language: English
  • ISSN: 1992-1950
  • DOI: 10.5897/IJPS
  • Start Year: 2006
  • Published Articles: 2533

Full Length Research Paper

Optical properties of as-deposited TiO2 thin films prepared by DC sputtering technique

M. M. Abd El-Raheem1,2 and Ateyyah M. Al-Baradi1
1Department of Physics, Faculty of Science, Taif University, Taif 888, Saudi Arabia. 2Department of Physics, Faculty of Science, Sohag University, Sohag 82524, Egypt.
Email: [email protected]

  •  Accepted: 08 August 2013
  •  Published: 23 August 2013

Abstract

Amorphous titanium dioxide TiO2 thin films have been deposited using the dc sputtering technique. The structure of the films was analyzed by X-ray diffraction and the results showed non-crystalline behavior. The optical properties of these thin films have been investigated by means of optical reflectance and transmittance spectra. The optical energy gap Eg, the Urbach tails Eu, the single oscillator energy Eo, the dispersion energy Ed and the optical constants as refractive index n, extinction coefficient k dielectric constant and optical conductivity were estimated.

 

Key words: Titanium dioxide, optical energy gap, refractive index, oscillator energy, dispersion energy.