International Journal of
Physical Sciences

  • Abbreviation: Int. J. Phys. Sci.
  • Language: English
  • ISSN: 1992-1950
  • DOI: 10.5897/IJPS
  • Start Year: 2006
  • Published Articles: 2572

Full Length Research Paper

Influence of etching on the optical properties of a-plane-oriented ZnO epilayers grown by plasma-assisted molecular beam epitaxy

Bassirou, L. O.
  • Bassirou, L. O.
  • Université Cheikh Anta Diop, Dakar, Senegal.
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  •  Received: 20 October 2015
  •  Accepted: 24 November 2015
  •  Published: 16 December 2015

How to cite this article

APA /
Bassirou, L. O. (2015). Influence of etching on the optical properties of a-plane-oriented ZnO epilayers grown by plasma-assisted molecular beam epitaxy. International Journal of Physical Sciences, 10(23), 584-589.
Chicago /
Bassirou, L. O.. "Influence of etching on the optical properties of a-plane-oriented ZnO epilayers grown by plasma-assisted molecular beam epitaxy." International Journal of Physical Sciences 10, no. 23 (2015): 584-589.
MLA /
Bassirou, L. O.. "Influence of etching on the optical properties of a-plane-oriented ZnO epilayers grown by plasma-assisted molecular beam epitaxy." International Journal of Physical Sciences 10.23 (2015): 584-589.
DOI /
https://doi.org/10.5897/IJPS2015.4427
URL /
https://academicjournals.org/journal/IJPS/article-abstract/28A87A656647

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This article is published under the terms of the Creative Commons Attribution License 4.0

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