Journal of
Engineering and Technology Research

  • Abbreviation: J. Eng. Technol. Res.
  • Language: English
  • ISSN: 2006-9790
  • DOI: 10.5897/JETR
  • Start Year: 2009
  • Published Articles: 198

Full Length Research Paper

Electrical characterization of in-house fabricated polysilicon micro-gap for yeast concentration measurement

Th. S. Dhahi1*, U. Hashim1, N. M. Ahmed2, Md. Eaqub Ali and T. Nazwa
  1Institute of Nano Electronic Engineering,University Malaysia Perlis (UniMAP), Malaysia. 2School of Physics, University Sains Malaysia (USM),Malaysia.
Email: [email protected]

  •  Accepted: 07 March 2011
  •  Published: 31 August 2011

Abstract

Fabrication and electrical characterization of micro-gaps and their properties are discussed with their applications in electrochemical sensors and bimolecular detection. To understand the relationship between the biosensor and micro-structure we have carried out the fabrication and characterization of micro-gap structures for yeast concentration measurement. In this paper two photo mask designs are used. The first mask is for defining the lateral micro-gap and the second one is for the aluminum electrode pattern. Lateral micro-gaps are formed using polysilicon and Al as contact pads. Conventional photolithography techniques are used to fabricate the micro-gap. The electrical measurements were carried out using a Semiconductor Parameter Analyzer to measure the change in capacitance across the micro-gap with the yeast solution drop put across the gap. The measured value of capacitance for each yeast concentration is presented as a function of the gap size. The results indicate that these micro-gaps could possibly be used for yeast sensor applications.

Key words: Micro-gap, conductivity, yeast detection, capacity, electrochemical sensor.